finFET TRANSISTOR AND CIRCUIT

ABSTRACT

A drive strength tunable FinFET, a method of drive strength tuning a FinFET, a drive strength ratio tuned FinFET circuit and a method of drive strength tuning a FinFET, wherein the FinFET has either at least one perpendicular and at least one angled fin or has at least one double-gated fin and one split-gated fin.

This application is a division of copending U.S. patent application Ser.No. 11/969,339 filed Jan. 4, 2008 which is continuation of copendingU.S. patent application Ser. No. 11/458,250 filed on Jul. 18, 2006, nowU.S. Pat. No. 7,368,355 issued May 6, 2008 which is a divisionalapplication of U.S. patent application Ser. No. 10/709,076 filed on Apr.12, 2004, now U.S. Pat. No. 7,115,920 issued on Oct. 3, 2006.

FIELD OF THE INVENTION

The present invention relates to the field of FinFET (fin field effecttransistors); more specifically, it relates to FinFETs with tuned drivestrength, methods tuning the drive strength of FinFETs and circuitsutilizing FinFETs with tuned drive strengths.

BACKGROUND OF THE INVENTION

Integrated circuit technology and complementary metal-oxide-silicon(CMOS) technology is ever pushed in the direction of higher performanceand hence smaller transistor dimensions. Below about 65 nm FinFETtechnology is emerging as the technology to carry forward the pursuit ofhigh performance circuits. At the high performance levels utilizingsub-65 nm dimensions, very fine tuning the drive strengths oftransistors in integrated circuits becomes critical, however, no methodpresently exists for doing this for circuits made up of FinFETs becauseof the quantized nature of their structures. Thus, there is a need forfine tunable drive strength FinFETs and methods of fine-tuning the drivestrength of FinFETs.

SUMMARY OF THE INVENTION

A first aspect of the present invention is an electronic device,comprising: a source and a drain; a single-crystal first fin havingfirst and second opposing ends and first and second opposing sidewallsand extending along a first longitudinal axis from the first to thesecond end of the first fin, the first end of the first fin in contactwith the source and the second end of the first fin in contact with thedrain, the first longitudinal axis aligned to a crystal plane; asingle-crystal second fin having first and second opposing ends andfirst and second opposing sidewalls and extending along a secondlongitudinal axis from the first to the second end of the second fin,the first end of the second fin in contact with the source and thesecond end of the second fin in contact with the drain, the secondlongitudinal axis aligned in a plane rotated away from the crystalplane; and a single conductive gate in contact with a gate dielectricformed on the first and second sidewalls of the first fin and on thefirst and second sidewalls of the second fin.

A second aspect of the present invention is a method for tuning thedrive strength of an electronic device, comprising: forming a source anda drain in a single-crystal material; forming a single-crystal first finfrom the single-crystal material, the first fin having first and secondopposing ends and first and second opposing sidewalls and extendingalong a first longitudinal axis from the first to the second end of thefirst fin, the first end of the first fin in contact with the source andthe second end of the first fin in contact with the drain; aligning thefirst longitudinal axis to a crystal-plane of the single-crystalmaterial; forming a single-crystal second fin from the single-crystalmaterial, the second fin having first and second opposing ends and firstand second opposing sidewalls and extending along a second longitudinalaxis from the first to the second end of the second fin, the first endof the second fin in contact with the source and the second end of thesecond fin in contact with the drain; aligning the second longitudinalaxis to a plane rotated away from the crystal plane; and providing aconductive gate in contact with a gate dielectric formed on the firstand second sidewalls of the first fin and on the first and secondsidewalls of the second fin.

A third aspect of the present invention an integrated circuit,comprising: a first transistor comprising: a first source and a firstdrain; a single-crystal first fin having first and second opposing endsand first and second opposing sidewalls and extending along a firstlongitudinal axis from the first to the second end of the first fin, thefirst end of the first fin in contact with the first source and thesecond end of the first fin in contact with the first drain, the firstlongitudinal axis aligned to a crystal plane; a single-crystal secondfin having first and second opposing ends and first and second opposingsidewalls and extending along a second longitudinal axis from the firstto the second end of the second fin, the first end of the second fin incontact with the first source and the second end of the second fin incontact with the first drain, the second longitudinal axis aligned in aplane rotated away from the crystal plane; and a first conductive gatein contact with a gate dielectric formed on the first and secondsidewalls of the first fin and on the first and second sidewalls of thesecond fin; and a second transistor comprising: a second source and asecond drain; a single-crystal third fin having first and secondopposing ends and first and second opposing sidewalls and extendingalong a third longitudinal axis from the first to the second end of thethird fin, the first end of the third fin in contact with the secondsource and the second end of the first fin in contact with the seconddrain, the third longitudinal axis aligned to the crystal plane; and asecond conductive gate in contact with a gate dielectric formed on thefirst and second sidewalls of the third fin and on the first and secondsidewalls of the third fin.

A fourth aspect of the present invention is a method of tuning the drivestrength ratio between a first transistor and a second transistor in anintegrated circuit, comprising: providing the first transistor, thefirst transistor comprising: a first source and a first drain; asingle-crystal first fin having first and second opposing ends and firstand second opposing sidewalls and extending along a first longitudinalaxis from the first to the second end of the first fin, the first end ofthe first fin in contact with the first source and the second end of thefirst fin in contact with the first drain, the first longitudinal axisaligned to a crystal plane; a single-crystal second fin having first andsecond opposing ends and first and second opposing sidewalls andextending along a second longitudinal axis from the first to the secondend of the second fin, the first end of the second fin in contact withthe first source and the second end of the second fin in contact withthe first drain, the second longitudinal axis aligned in a plane rotatedaway from the crystal plane; and a first conductive gate in contact witha gate dielectric formed on the first and second sidewalls of the firstfin and on the first and second sidewalls of the second fin; andproviding the second transistor, the second transistor comprising: asecond source and a second drain; a single-crystal third fin havingfirst and second opposing ends and first and second opposing sidewallsand extending along a third longitudinal axis from the first to thesecond end of the third fin, the first end of the third fin in contactwith the second source and the second end of the first fin in contactwith the second drain, the third longitudinal axis aligned to thecrystal plane; and a second conductive gate in contact with a gatedielectric formed on the first and second sidewalls of the third fin andon the first and second sidewalls of the third fin.

A fifth aspect of the present invention is an electronic device,comprising: a source and a drain; a single-crystal first fin havingfirst and second opposing ends and first and second opposing sidewalls,the first end of the first fin in contact with the source and the secondend of the first fin in contact with the drain, the first longitudinalaxis aligned to a crystal plane; a single-crystal second fin havingfirst and second opposing ends and first and second opposing sidewalls,the first end of the second fin in contact with the source and thesecond end of the second fin in contact with the drain; a firstconductive gate in contact with a gate dielectric formed on the firstand second sidewalls of the first fin and on the first sidewall of thesecond fin; and a second conductive gate in contact with a gatedielectric formed on the second sidewall of the second fin.

A sixth aspect of the present invention is a method for tuning the drivestrength of an electronic device, comprising: providing a source and adrain, providing a single-crystal first fin having first and secondopposing ends and first and second opposing sidewalls, the first end ofthe first fin in contact with the source and the second end of the firstfin in contact with the drain; providing a single-crystal second finhaving first and second opposing ends and first and second opposingsidewalls, the first end of the second fin in contact with the sourceand the second end of the second fin in contact with the drain;providing a first conductive gate in contact with a gate dielectricformed on the first and second sidewalls of the first fin and on thefirst sidewall of the second fin; providing a second conductive gate incontact with a gate dielectric formed on the second sidewall of thesecond fin; and connecting the first gate to a first voltage source at afirst voltage level and connecting the second gate a second voltagesource at a second voltage level, the first and second voltage levelsbeing different.

A seventh aspect of the present invention is an integrated circuit,comprising: a first transistor comprising: a first source and a firstdrain; a single-crystal first fin having first and second opposing endsand first and second opposing sidewalls, the first end of the first finin contact with the first source and the second end of the first fin incontact with the first drain; a single-crystal second fin having firstand second opposing ends and first and second opposing sidewalls, thefirst end of the second fin in contact with the first source and thesecond end of the second fin in contact with the first drain; a firstconductive gate in contact with a gate dielectric formed on the firstand second sidewalls of the first fin and on the first sidewall of thesecond fin; and a second conductive gate in contact with a gatedielectric formed on the second sidewall of the second fin; and a secondtransistor comprising: a second source and a second drain; asingle-crystal third fin having first and second opposing ends and firstand second opposing sidewalls, the first end of the third fin in contactwith the second source and the second end of the third fin in contactwith the second drain; and a third conductive gate in contact with agate dielectric formed on the first and second sidewalls of the thirdfin and on the first and second sidewall of the third fin.

An eighth aspect of the present invention is a method of tuning thedrive strength ratio between a first transistor and a second transistorin an integrated circuit, comprising providing the first transistor, thefirst transistor comprising: a first source and a first drain; asingle-crystal first fin having first and second opposing ends and firstand second opposing sidewalls, the first end of the first fin in contactwith the first source and the second end of the first fin in contactwith the first drain; a single-crystal second fin having first andsecond opposing ends and first and second opposing sidewalls, the firstend of the second fin in contact with the first source and the secondend of the second fin in contact with the first drain; a firstconductive gate in contact with a gate dielectric formed on the firstand second sidewalls of the first fin and on the first sidewall of thesecond fin; and a second conductive gate in contact with a gatedielectric formed on the second sidewall of the second fin; providingthe second transistor, the second transistor comprising: a second sourceand a second drain; a single-crystal third fin having first and secondopposing ends and first and second opposing sidewalls, the first end ofthe third fin in contact with the second source and the second end ofthe third fin in contact with the second drain; and a third conductivegate in contact with a gate dielectric formed on the first and secondsidewalls of the third fin and on the first and second sidewall of thethird fin; and connecting the first gate to a first voltage source at afirst voltage level and connecting the second gate to a second voltagesource at a second voltage level, the first and second voltage levelsbeing different.

BRIEF DESCRIPTION OF DRAWINGS

The features of the invention are set forth in the appended claims. Theinvention itself, however, will be best understood by reference to thefollowing detailed description of an illustrative embodiment when readin conjunction with the accompanying drawings, wherein:

FIG. 1 is an isometric view of representative fin portions of variousFinFETs according to the various embodiments of the present invention;

FIG. 2 is a plot of the reduction in transconductance in the linear andsaturation region of a FinFET vs. off angle axis θ;

FIG. 3A is a top view and FIG. 3B is a side view through line 3B-3B ofFIG. 3A of a FinFET transistor according to the first embodiment of thepresent invention;

FIG. 4A is a top view and FIG. 4B is a side view through line 4B-4B ofFIG. 4A of a FinFET transistor according to a second embodiment of thepresent invention;

FIG. 5 is an exemplary circuit utilizing a FinFET whose drive strengthhas been tuned according to the first embodiment of the presentinvention; and

FIG. 6 is an exemplary circuit utilizing a FinFET whose drive strengthhas been tuned according to the second embodiment of the presentinvention.

DETAILED DESCRIPTION OF THE INVENTION

In crystalline solids, the atoms, which make up the solid, are spatiallyarranged in a periodic fashion called a lattice. A crystal latticealways contains a volume, which is representative of the entire latticeand is regularly repeated throughout the crystal. In describingcrystalline semiconductor materials in the present disclosure, thefollowing conventions are used.

The directions in a lattice are expressed as a set of three integerswith the same relationship as the components of a vector in thatdirection. For example, in cubic lattices, such as silicon, which have adiamond crystal lattice, a body diagonal exists along the [111]direction with the [ ] brackets denoting a specific direction. Manydirections in a crystal lattice are equivalent by a symmetrytransformation, depending upon the arbitrary choice of orientation axes.For example, a crystal directions in the cubic lattice [100], [010] and[001] are all crystallographically equivalent. A direction and all itsequivalent directions are denoted by < > brackets. Thus, the designationof the <100> direction includes the equivalent [100], [010] and [001]positive directions as well as the equivalent negative directions[−100], [0-10] and [00-1].

Planes in a crystal may also be identified with a set of three integers.They are used to define a set of parallel planes and each set ofintegers enclosed in ( ) parentheses identifies a specific plane. Forexample the proper designation for a plane perpendicular to the [100]direction is (100). Thus, if either a direction or a plane of a cubiclattice is known, its perpendicular counterpart may be quicklydetermined without calculation. Many planes in a crystal lattice areequivalent by a symmetry transformation, depending upon the arbitrarychoice of orientation axes. For example, the (100), (010) and (001)planes are all crystallographically equivalent. A plane and all itsequivalent planes are denoted by { } parentheses. Thus, the designationof the {100} plane includes the equivalent (100), (010) and (001)positive planes as well as the equivalent planes (−100), (0-10) and(00-1).

FIG. 1 is an isometric view of representative fin portions of variousFinFETs according to the various embodiments of the present invention.In FIG. 1, a substrate 100 includes a support layer 105 having a topsurface 110, an isolation layer 115 having a top surface 120, theisolation layer formed on top surface 110 of support layer 105.Isolation layer 115 may comprise a buried oxide layer (BOX), or maycomprise a doped semiconductor region. Fins 125 and 130 are formed froma crystalline semiconductor material formed on top surface 120 of buriedisolation 115. Fins 125 and 130 may be composed of any appropriatesemiconductor material, including, but not limited to: Si, Ge, GaP,InAs, InP, SiGe, GaAs, or other group MN compounds. Fin 125 has parallelsidewalls 135 (only one sidewall is visible in FIG. 1) parallel to acrystal-plane 140. Fin 130 has parallel sidewalls 145 (only one sidewallis visible in FIG. 1) parallel to a crystal-plane 150. Plane 150 isoffset from crystal-plane 140 by an angle θ with respect to a commonaxis 152. In one example, fins 125 and 130, when used in an NFET FinFET(hereafter N FinFET) comprise single-crystal silicon and crystal-plane140 is a {100} crystal-plane and when used in a PFET FinFET (hereafter PFinFET), comprise single-crystal silicon and crystal-plane 140 is a{110} crystal-plane. In one example, when crystal plane 140 is a {100}crystal-plane, θ defines a rotation of fin 130 into the {110}crystal-plane and when crystal plane 140 is a {110} crystal-plane, θdefines a rotation of fin 140 into the {100} crystal-plane.

Fin 125 has a physical length L in a direction parallel to top surface120 of buried isolation layer 115 within plane 140 and a physical heightH in a direction perpendicular to the direction of physical length L.Fin 130 has a physical length L_(θ) in a direction parallel to topsurface 120 of buried isolation layer 115 within a plane 150 (which isoffset from plane 140 by angle θ) and a physical height H in a directionperpendicular to the direction of physical length L_(θ). Note, in aFinFET, the physical height of the fin determines the electrical channelwidth of the transistor. In a single gate FinFET (a gate formed on oneside of the fin) the physical height H determines the electrical channelwidth W. In a double-gate FinFET the channel width is twice the heightbecause there is a gate on either side of the fin, W is a function of2H. (See definition of a double-gate FinFET infra). The physical lengthof a FinFET fin defines the channel length of FinFET the same as forconventional FETs, thus the designation L or L_(θ) may be understood toalso mean channel length hereafter.

When fins 125 and 130 are incorporated into FinFETs, inversion carrierflow direction is in directions 155 and 160 respectively. Direction 155is parallel to sidewalls 135 and direction 160 is parallel to sidewalls145. It is well known, that inversion carrier flow is affected by thecrystal orientation of the fin of a FinFET. For N FinFETs, maximuminversion carrier (electron) mobility is along the {100} crystal-planeand for P FinFETs the maximum inversion carrier (hole) mobility is alongthe {110} crystal-plane. This is reflected in the transconductance (Gm)of a FinFET as illustrated in FIG. 2 and discussed infra.

FIG. 2 is a plot of the reduction in transconductance in the linear andsaturation region of a FinFET vs. off angle axis θ. Transconductance(Gm) is the ratio of output current to input voltage and is the measureof the gain of a FET. In FIG. 2 both the transconductance when thetransistor is operating in the linear region Gm lin (upper curve) andthe transconductance when the transistor is operating in the saturationregion Gm sat (lower curve) are only equal at θ (offset from the maximummobility axis)=0. Gm sat progressively fails off from Gm lin as θincreases.

The curves of FIG. 2 may be explained, in at least part, by thefollowing: The mobility of the electrons (inversion carriers) in thechannels of NFETs is nearly at its highest in the {100} plane andsignificantly lower in the {110} plane. The electron-mobility in the{110} plane is about half that in the {100} plane. The mobility of holes(inversion carriers) in the channels of PFETs is highest in the {110}plane and significantly lower in the {100} plane. The hole-mobility inthe {100} plane is about less than half that in the {110} plane. The{100} and {110} planes are orientated to each other at an angle of 45°when formed by vertical surfaces cut from a {100}-surfaced wafer.

FIG. 3A is a top view and FIG. 3B is a side view through line 3B-3B ofFIG. 3A of a FinFET transistor according to the first embodiment of thepresent invention. In FIG. 3A, FinFET 200 includes parallelsource/drains 205A and 205B in physical and electrical contact withopposite ends of single-crystal perpendicular fins 210 and an angledsingle-crystal fin 215. Perpendicular fins 210 are longitudinallyaligned with a plane 220, while angled fin 215 is longitudinally alignedwith a plane 225, which is offset (by rotation along a axis common toboth planes 210 and 225 as illustrated in FIG. 1 and described supra)from crystal plane 220 by an angle θ. The angle θ also represents arotation from a higher inversion carrier mobility direction to a lowermajor carrier mobility direction. Fins 210 are perpendicular tosource/drains 205A and 205B. A common gate 230 is formed overperpendicular fins 210 and angled fin 215 and is electrically isolatedfrom the fins by gate dielectric 235 formed on opposite sides of eachfin. Perpendicular fins 210 have a channel length L and angled fin 215has a channel length L_(θ) where L_(θ)=L/cos θ. Perpendicular fins 210and angled fin 215 have the same height H (see FIG. 3B).

Turning to FIG. 3B, it can be seen that perpendicular fins 210 andangled fin 215 have a height H and top surfaces 235 of perpendicularfins 210 and top surface 237 of angled fin 215 are electrically isolatedfrom gate 230 by dielectric caps 240. Note, it is possible to replacedielectric caps 240 with gate dielectric 230. Perpendicular fins 210 andangled fin 215 are formed on a top surface 245 of an insulating layer250, which is formed on a top surface 255 of a substrate 260.

In a first example, FinFET 200 is an N FinFET, source/drains 205A and205B are doped N-type, perpendicular fins 210 and angled fin 215comprises comprise P-doped, lightly N-doped or intrinsicmono-crystalline silicon, plane 220 is a {100} crystal-plane and θ is anangle of rotation into the {110} crystal-plane. In a second example,FinFET 200 is a P FinFET, source/drains 205A and 205B are doped P-type,perpendicular fins 210 and angled fin 215 comprise N-doped, or lightlyP-doped or intrinsic mono-crystalline silicon, plane 220 is a {110}crystal-plane and θ is an angle of rotation into the {100}crystal-plane.

Lightly doped N or P monocrystalline silicon is defined has having adoping level that will not prevent formation of a inversion layer in thechannel region under the gate of the fin between the source and drainsof a FinFET with a normal operating voltage applied to the gate. In oneexample, lightly doped silicon has an N or P dopant speciesconcentration of about 10¹⁵ atm/cm³ or less.

The drive strength of a transistor is defined as the measure of theamount of current the transistor can supply. The ratio of drivestrengths between PFETS and NFETS in integrated circuits is an importantconsideration as will be described infra. The relative drive strength ofFinFET 200 is given in equation 1.

β≈(W/L)(3+(cos θ)(1−0.9(|θ/45°|))), |θ|<45°  (1)

where:β=the relative drive strength of the transistor;W=the channel width of each fin;L=the length of the three perpendicular fins 205; andθ=the angle between the three perpendicular fins and the angled fin.

While three perpendicular fins 210 and one angled fin 215 areillustrated in FIGS. 3A and 3B, there may be any number from one upwardof perpendicular fins 210 and any number from one upward of angled fins215. There must be at least one perpendicular fin 210 and one angled fin215. In the general case, of N perpendicular fins 210 and M angled fins215 the relative drive strength of the general case tunable drivestrength FinFET is given in equation 2.

β≈(W/L)(N+M cos(θ) (1−0.9(|θ/45°|))), |θ|<45°  (2)

where:β=the relative drive strength of the transistor;N=the number of perpendicular fins;M=the number of angled fins;W=the channel width of each fin;L=the length of the perpendicular fins; andθ=the angle between the perpendicular fins and the angled fin, indegrees.

In a FinFET using only perpendicular fins the granularity of control ofdrive strength is related to the number of fins and is very coarseunless there are a prohibitive number of fins. The drive strength of aFinFET incorporating at least one perpendicular fin and one angled fincan be adjusted by not only the total number of fins of each type, butby the angle of the angled fin(s) relative to the perpendicular fin.This degree of tuning is only limited by the incremental control of theprocess in imaging incremental changes in fin angle (θ) and the minimumreduction (about 0.5) at a corresponding maximum angle (about 45°) incarrier mobility that can be realized. Increments below about 0.5 can beobtained with multiple angled fins. See Table I.

TABLE I Drive Strength Number Angle Between (Multiples of PerpendicularNumber of Perpendicular W/L) Fins Angled Fins and Angled Fins 3 3 0 N/A4 4 0 N/A 3.8 3 1 ~10° 3.2 2 2 ~10°

Before describing the second embodiment of the present invention theteens double-gate and split-gate need to be defined. A double-gatetransistor is defined as a transistor having two dependent gates, in thecase of a FinFET, the gates are located on opposing sidewalls of the finand electrically connected. They may be integral to one another as well,as is illustrated in FIGS. 4A and 4B. A split-gate transistor is definedas a transistor having two independent gates, in the case of a FinFET,the gates are located on opposing sidewalls of the fin and areelectrically isolated from one another.

FIG. 4A is a top view and FIG. 4B is a side view through line 4B-4B ofFIG. 4A of a FinFET transistor according to a second embodiment of thepresent invention. In FIG. 4A, FinFET 300 includes parallelsource/drains 305A and 305B in physical and electrical contact withopposite ends of single-crystal double-gate fins 310 and asingle-crystal split-gate fin 315. Double-gate fins 310 and split-gatefin 315 are longitudinally aligned with mutually parallel planes 320.Planes 320 may be higher inversion carrier mobility planes, for example{100} for N FinFETs and {110} for P FinFETs. Double-gate fins 310 andsplit-gate fin 315 are perpendicular to source/drains 305A and 305B. Agate dielectric 330 is formed on sidewalls of double-gate fins 310 andsplit-gate fin 315. A first gate 335 is formed over double-gate fins 310and contacts gate dielectric 330 on formed on both sidewalls of eachdouble-gate fin 315. First gate 335 also contacts gate dielectric 330formed on a first side 340A of split-gate fin 315. A second gate 345contacts gate dielectric 330 formed on a second side of split-gate fin315. Double-gate fins 305A and split-gate fin 315 have the same channellength L and have the same height H (see FIG. 4B).

Turning to FIG. 4B, it can be seen that double-gate fins 310 andsplit-gate fin 315 have a height H and top surfaces 350 of double-gatefins 310 are electrically isolated from first gate 335 by dielectriccaps 355. A dielectric cap 365 is formed on a top surface 360 ofsplit-gate fin 315. Note, it is possible to replace dielectric caps 355and 365 with gate dielectric 330. Double-gate fins 310 and split-gatefin 315 are formed on a top surface 370 of an insulating layer 375,which is formed on a top surface 380 of a substrate 385.

In a first example, FinFET 300 is an N FinFET, source/drains 305A and305B are doped N-type, double-gate fins 310 and split-gate fin 315comprise P-doped, lightly N-doped or intrinsic mono-crystalline silicon,and plane 320 has {100} orientation. In a second example, FinFET 300 isa P FinFET, source/drains 305A and 3105B are doped P-type, double-gatefins 310 and split-gate fin 315 comprise N-doped, lightly P-doped, orintrinsic mono-crystalline silicon, and plane 320 is a {110}crystal-plane

The drive strength contribution of split-gate fin 315 with zero voltageon second gate 345 is about half that of a double-gate fin 310. Thedrive strength contribution of split-gate fin 315 can be varied betweenabout zero to the same as that of double-gate fins 310 by varying thevoltage applied to second gate 345. By increasing the voltage(magnitude) from zero toward the voltage (magnitude) applied to firstgate 335 the drive strength of split-gate fin 315 can be increased. Bybiasing second gate 345 more negative than the source for an N FinFET ormore positive than the source for a P FinFET, the drive strength ofsplit-gate fin 315 can be decreased.

While three double-gate fins 310 and one split-gate fin 315 areillustrated in FIGS. 4A and 4B, there may be any number from one upwardof double-gate fins 310 and any number from one upward of split-gatefins 315. For example, the two outermost fins of a set of fins may veryeasily be fabricated as split-gate fins. Inner fins may be formed assplit-gate fins, but more complicated gate shape layouts (when viewed intop or plan view) are required.

Many high performance CMOS circuits require a precise ratio of drivestrengths between specific PFETs and specific NFETs in order to achievea balance between noise immunity, performance and power. The drivestrength ratio (also called the Beta-ratio) is the quotient given by theeffective channel width-to-length (W/L) ratio of the PFET divided by theeffective channel width-to-length (W/L) ratio of the NFET. The FinFETtransistors described supra, allow fine-tuning of the Beta-ratio.

In FIGS. 5 and 6 transistors bodies (exclusive of the source/drains) areformed from one of more mono-crystalline fins, thus in the descriptionof FIGS. 5 and 6, the term fin can be read as body as well.

FIG. 5 is an exemplary circuit utilizing a FinFET whose drive strengthhas been tuned according to the first embodiment of the presentinvention. In FIG. 5, a latch circuit 400 includes transistors T1, T2,T3 and an inverter IL Transistors T1, T2 and T3 are double-gate FinFETtransistors. Transistor T1 is illustrated as an N FinFET having a onefin 405. Transistor T2 is illustrated as an N FinFET having threeperpendicular fins 410 and one angle fin 415 and a common gate. Angledfin 410 is also designated with the symbol θ. Transistor T3 isillustrated as a P FinFET having four perpendicular fins 420 and acommon gate. The source of transistor T1 is coupled to an input signal,the gate of transistor T1 is coupled to a CLK signal and the drain oftransistor T1 is coupled to the gates of transistors T2 and T3, thedrains of transistors T2 and T3 and the input and output of inverter I1.The source of transistor T3 is coupled to VDD and the source oftransistor T2 is coupled to VSS.

The drive strength ratio (also known as the beta ratio), β_(T3)/β_(T2)of latch circuit 400 can be tuned (in the sense of set duringmanufacture of the circuit) by rotation of fin 415 of transistor T2 in adirection relative to the direction of fins 410 that reduces themobility of the inversion carriers in fin 415 relative to the mobilityof the inversion carriers in fins 410.

It should be noted, that while only transistor T2 is illustrated in FIG.5 and described as being drive strength tunable, either or both oftransistors T2 or T3 may be drive strength tunable according to thefirst embodiment of the present invention.

FIG. 6 is an exemplary circuit utilizing a FinFET whose drive strengthhas been tuned according to the second embodiment of the presentinvention. In FIG. 6, a latch circuit 450 includes transistors T4, T5,T6 and an inverter I2. Transistor T4 is a double-gate FinFET transistor.Transistors T5 and T6 are mixed gate FinFET transistors having multipledouble-gate fins and one split-gate fin each. Transistor T4 isillustrated as an N FinFET having one double-gate fin 455. Transistor T5is illustrated as an N FinFET having three fins 460 and one fin 465, afirst gate common to all gate regions of fins 460 and a first gateregion of fin 465, and a second gate connected only to a second gateregion of fin 465. Transistor T6 is illustrated as a P FinFET havingthree fins 470 and one fin 475, a first gate common to all gate regionsof fins 470 and a first gate region of fin 475, and a second gateconnected only to a second gate region of fin 475. The source oftransistor T4 is coupled to an input signal, the gate of transistor T4is coupled to a CLK signal and the drain of transistor T4 is coupled tothe first gates of transistors T5 and T6, the drains of transistors T5and T6 and the input and output of inverter I2. The second gate oftransistor T5 is coupled to a voltage source VTUNE-N and the second gateof transistor T6 is coupled to a voltage source VTUNE-P. The source oftransistor T6 is coupled to VDD and the source of transistor T5 iscoupled to VSS.

The drive strength ratio, β_(T6)/β_(T5) of latch circuit 450 can bedynamically tuned (in the sense of set during operation) by adjustmentof VTUNE-N, VTUNE-P or both VTUNE-N and VTUNE-P. Further, the drivestrength ratio β_(T6)/β_(T5) of latch circuit 450 may be permanentlyfixed by programming fuses to set the voltage levels of VTUNE-N andVTUNE=P.

It should be noted, that while both transistors T5 and T6 areillustrated as having tunable drive strength transistors, only one oftransistors T5 or T6 need be drive strength tunable according to thesecond embodiment of the present invention.

Other circuits that may be drive strength ratio “tuned” by the methodsof the first and second embodiments of the present invention include,but are not limited to static random access memory (SRAM) circuits,phase locked loop (PLL) circuits, dynamic domino circuits, andimbalanced static combinational CMOS logic circuits.

Thus, the present invention provides fine-tunable drive strength FinFETsand methods for fine-tuning the drive strength of FinFETs.

The description of the embodiments of the present invention is givenabove for the understanding of the present invention. It will beunderstood that the invention is not limited to the particularembodiments described herein, but is capable of various modifications,rearrangements and substitutions as will now become apparent to thoseskilled in the art without departing from the scope of the invention.For example, in the first embodiment of the present invention, theentire angled fin need not be set at an angle relative to theperpendicular fin, but may be bent so a portion of the angled fin isparallel to the perpendicular fin and a portion angled relative to theperpendicular fin. Therefore, it is intended that the following claimscover all such modifications and changes as fall within the true spiritand scope of the invention.

1. A method for tuning the drive strength of an electronic device,comprising: forming a source and a drain in a single-crystal material;forming a single-crystal first fin from said single-crystal material,said first fin having first and second opposing ends and first andsecond opposing sidewalls and extending along a first longitudinal axisfrom said first to said second end of said first fin, said first end ofsaid first fin in contact with said source and said second end of saidfirst fin in contact with said drain; aligning said first longitudinalaxis to a crystal-plane of said single-crystal material; forming asingle-crystal second fin from said single-crystal material, said secondfin having first and second opposing ends and first and second opposingsidewalls and extending along a second longitudinal axis from said firstto said second end of said second fin, said first end of said second finin contact with said source and said second end of said second fin incontact with said drain; aligning said second longitudinal axis to aplane rotated away from said crystal plane; and forming a singleconductive gate in contact with a gate dielectric formed on said firstand second sidewalls of said first fin and on said first and secondsidewalls of said second fin.
 2. The method of claim 1, wherein saidcrystal plane has orthogonal first and second axes, said plane hasorthogonal first and second axes and said first axis of said crystalplane and said first axis of said plane are mutually parallel.
 3. Themethod of claim 1, wherein said source and said drain are doped N-type,said first fin and said second fin independently comprise P-doped,lightly N-doped or intrinsic mono-crystalline silicon, said crystalplane is a {100} crystal-plane and said plane is rotated toward a {110}crystal-plane.
 4. The method of claim 1, wherein said source and saiddrain are doped P-type, said first fin and said second fin independentlycomprise N-doped, lightly P-doped or intrinsic mono-crystalline silicon,said crystal-plane is a {110} crystal-plane and said plane is rotatedtoward a {100} crystal-plane.
 5. The method of claim 1, wherein saiddevice has a drive strength, said drive strength being a function of anangle between said first longitudinal axis and said second longitudinalaxis.
 6. The method of claim 1, wherein a mobility of inversion carriersalong said first longitudinal axis is greater than a mobility ofinversion carriers along said second longitudinal axis.
 7. The method ofclaim 1, further including: forming a single-crystal third fin from saidsingle-crystal material, said third fin having first and second opposingends and first and second opposing sidewalls and extending along saidfirst longitudinal axis from said first to said second end of said thirdfin, said first end of said third fin in contact with said source andsaid second end of said third fin in contact with said drain; fanningsaid gate dielectric on said first and second sidewalls of said thirdfin; and forming said conductive gate in contact with said gatedielectric formed on said first and second sidewalls of said third fin.8. The method of claim 7, wherein said third fin is positioned betweensaid first fin and said second fin.
 9. A method for tuning the drivestrength of an electronic device, comprising: providing a source and adrain; providing a single-crystal first fin having first and secondopposing ends and first and second opposing sidewalls, said first end ofsaid first fin in contact with said source and said second end of saidfirst fin in contact with said drain; providing a single-crystal secondfin having first and second opposing ends and first and second opposingsidewalls, said first end of said second fin in contact with said sourceand said second end of said second fin in contact with said drain;providing a first conductive gate in contact with a gate dielectricformed on said first and second sidewalls of said first fin and on saidfirst sidewall of said second fin; providing a second conductive gate incontact with a gate dielectric formed on said second sidewall of saidsecond fin; and connecting said first gate to a first voltage source ata first voltage level and connecting said second gate a second voltagesource at a second voltage level, said first and second voltage levelsbeing different.
 10. The method of claim 9, wherein said first andsecond voltage levels have different magnitudes, different polarities orboth different magnitudes and polarities.
 11. The method of claim 9,where said drive strength is a function of a magnitude and polarity ofsaid second voltage source.
 12. The method of claim 9, wherein saidsource and said drain are doped N-type, said first fin and said secondfin comprise intrinsic, lightly N-doped or P-doped mono-crystallinesilicon and wherein said first and said second fins are aligned in adirection from respective said first ends of said first and said secondfins to respective said second ends of said first and said second finsto a {100} crystal-plane.
 13. The method of claim 9, wherein said sourceand said drain are doped P-type, said first fin and said second finindependently comprise intrinsic, N-doped or lightly P-dopedmono-crystalline silicon and wherein said first and said second fins arealigned in a direction from respective said first ends of said first andsaid second fins respective said second ends of said first and saidsecond fins to a {110} crystal-plane.
 14. A method of tuning the drivestrength ratio between a first transistor and a second transistor in anintegrated circuit, comprising: providing said transistor, said firsttransistor comprising: a first source and a first drain; asingle-crystal first fin having first and second opposing ends and firstand second opposing sidewalls, said first end of said first fin incontact with said first source and said second end of said first fin incontact with said first drain; a single-crystal second fin having firstand second opposing ends and first and second opposing sidewalls, saidfirst end of said second fin in contact with said first source and saidsecond end of said second fin in contact with said first drain; a firstconductive gate in contact with a gate dielectric formed on said firstand second sidewalls of said first fin and on said first sidewall ofsaid second fin; and a second conductive gate in contact with a gatedielectric formed on said second sidewall of said second fin; providingsaid second transistor, said second transistor comprising: a secondsource and a second drain; a single-crystal third fin having first andsecond opposing ends and first and second opposing sidewalls, said firstend of said third fin in contact with said second source and said secondend of said third fin in contact with said second drain; and a thirdconductive gate in contact with a gate dielectric formed on said firstand second sidewalls of said third fin and on said first and secondsidewall of said third fin; and connecting said first gate to a firstvoltage source at a first voltage level and connecting said second gateto a second voltage source at a second voltage level, said first andsecond voltage levels being different.
 15. The method of claim 14,wherein said first and second voltage levels have different magnitudes,different polarities or both different magnitudes and polarities. 16.The method of claim 14, where said drive strength is a function of amagnitude and polarity of said second voltage source.
 17. The method ofclaim 14 wherein said first source and said first drain are doped N-typesaid second source and said second drain are doped P-type, said firstfin and said second fin independently comprise intrinsic, lightlyN-doped or P-doped mono-crystalline silicon and said third fin comprisesintrinsic, N-doped or lightly P-doped mono-crystalline silicon.
 18. Themethod of claim 17, wherein first and second fins are aligned in adirection from respective said first ends of said first and said secondfins to respective said second ends of said first and said second finsto a {100} crystal-plane and said third fin is aligned in a directionfrom said first end to said second end of said third fin to a {110}crystal-plane.
 19. The method of claim 14, wherein said first source andsaid first drain are doped P-type, said second source and said seconddrain are doped N-type, said first fins and said second finindependently comprise intrinsic, N-doped or lightly P-dopedmono-crystalline silicon and said third fin comprises intrinsic, lightlyN-doped or P-doped mono-crystalline silicon.
 20. The method of claim 19,wherein first and second fins are aligned in a direction from respectivesaid first ends of said first and said second fins to said second endsof said first and said second fins to a {110} crystal-plane and saidthird fin is aligned in a direction from said first end to said secondend of said third fin to a {100} crystal-plane.